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Industry application
Semiconductors
Clean
When contaminants such as metals and particles present on the wafer surface affect the performance and output of the equipment, the cleaning process is repeated before and after the process.
Products
NF3
Nitrogen Trifluoride
High purity Nitrogen Trifluoride purity:5N+
  • Molecular Weight: 71.01 g/mol
  • Boiling Point: -194.2 °F@1atm
  • CAS No.:7783-54-2
  • UN No: UN2451
  • F2/N2
    20%F2/N2 Fluorine bal Nitrogen
    High purity 20%F2/N2 Fluorine bal Nitrogen purity :4N+(F2)/6N+(N2)
  • Molecular Weight: 38 g/mol(F2)/28.01 g/mol(N2)
  • Boiling Point: -306.6 °F@1atm(F2)/-320.44 °F@1atm(N2)
  • CAS No.:7782-41-4(F2)/7727-37-9(N2)
  • UN No: UN1045(F2)/UN1066(N2)