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Spectrum's craftsmanship is conveyed through high-quality materials and technology; the possibilities of gases in the field of application are endless.
Industry application
Semiconductors
IMP
Ion implantation is the injection of impurity ions with high energy into a semiconductor substrate and is the most widely used mainstream doping process.
Products
GeF4
Germanium Tetrafluoride
High purity GeF4 Germanium Tetrafluoride purity:4N+
  • Molecular Weight: 148.6 g/mol
  • Boiling Point: -28.66 °F@1atm
  • CAS No.:7783-58-6
  • UN No: UN3304